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In recent years, optical maskless lithography technique based on spatial light modulator(SLM) has been attracted wide attentions. 近年來，空間光調制器(SLM)無掩模光刻技術受到微電子及相關領域的廣泛關注。
The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division. 摘要無掩模激光乾涉光刻中的分束方法一般有波前分割和振幅分割。
The key of this research is studying or producing small amount of the Maskless Technology to taking place of tradition mask, and also fabricate TFT device. 本研究目的在於研發或少量生産得以無光罩微影技術取代傳統光罩，竝制作出TFT元件。